SILICON

Table of main properties of silicon

Property Typical Value Remarks
Density ~2.33 g/cm³ Low
Young’s modulus (E) ~130–185 GPa High (anisotropic)
Tensile strength ~150–700 MPa Depends on structure and defects
Hardness (HV) ~700–1200 HV Very high
Thermal conductivity ~120–150 W/m·K High
Electrical conductivity Semiconductor Depends on doping
Thermal expansion ~2.5–3 ×10⁻⁶ /K Very low
Melting point ~1414 °C
Magnetism No Non-magnetic
Corrosion resistance Excellent Forms stable oxide layer
Machinability Not machinable (brittle) Produced by etching (DRIE, etc.)

Silicon belongs to the family of metalloids. It is a semiconductor material derived from the microelectronics industry, introduced into watchmaking in the early 2000s. It is now widely used for the production of critical components, particularly in the regulating organ (hairsprings) and the escapement.

Its shaping relies on microfabrication processes, notably DRIE etching (Deep Reactive Ion Etching), which enables extremely precise and highly repeatable geometries. Silicon stands out above all for its exceptional physical properties, particularly suited to modern watchmaking requirements.

Main Properties

Silicon exhibits a set of unique properties:

  • Non-magnetic material
  • Very low density (~2.3 g/cm³)
  • High Young’s modulus (~130–190 GPa depending on crystal orientation)
  • Excellent wear resistance
  • Very low thermal expansion coefficient (~2.5 ×10⁻⁶ /K)
  • No lubrication required (low friction coefficient)
  • Very high achievable geometric precision

These properties make it particularly suitable for components subjected to dynamic stresses.

Silicon used in watchmaking is monocrystalline, which gives it:

  • High homogeneity
  • No internal defects
  • Directional mechanical properties (anisotropy)

Unlike metals, silicon is:

  • Brittle (fragile)
  • Non-ductile
  • Insensitive to plastic deformation

It therefore cannot be deformed or reworked after fabrication.

Silicon can be surface-modified to enhance certain properties:

  • Thermal oxidation → formation of a SiO₂ layer
  • Coatings (e.g., vapor phase depositions, nitrides)
  • Passivation → improved stability

These treatments make it possible to:

  • Reduce friction
  • Improve resistance
  • Stabilize performance

Silicon is primarily used for:

Its properties enable:

Reduced friction

  • Improved frequency stability
  • Elimination of lubrication
  • Insensitivity to magnetic fields

Advantages

  • Non-magnetic
  • Very lightweight
  • Excellent thermal stability
  • High manufacturing precision
  • No lubrication required
  • High wear resistance
  • Enables innovative and complex component geometries
  • Allows extremely high precision and repeatability
  • Reduced production costs

Limitations

  • Brittleness (fragile material)
  • No plastic deformation possible
  • No possibility of traditional adjustment or finishing (timing, escapement adjusting)
  • Dependence on advanced and costly industrial processes
  • Non-repairable